Publications

Conference Publications

  1. Yuansheng Ma, Jason Sweis, Yunfei Deng, Jongwook Kye, Jason P. Cain, Harry J. Levinson, “Decomposition strategies for self-aligned double patterning,” in Design for Manufacturability through Design-Process Integration IV, Michael L. Rieger, ed., Proc. SPIE 7641, 2010.
  2. Ryoung-Han Kim, Sivananda Kanakasabapathy, Sanjay Mehta, Yuansheng Ma, Martin Burkhardt, Jason P. Cain, Gregory McIntyre, Matthew E. Colburn, Harry J. Levinson, “Spacer-defined double patterning for sub-72-nm pitch logic technology,” in Optical Microlithography XXIII, Mircea V. Dusa, ed., Proc. SPIE 7640, 2010.
  3. Jason P. Cain, Luigi Capodieci, “Computational technology scaling from 32 nm to 28 and 22 nm through systematic layout printability verification,” in Design for Manufacturability through Design-Process Integration III, Vivek Singh, ed., Proc. SPIE 7275, 2009. 816 KB PDF
  4. Jason P. Cain, Mark Threefoot, Kishan Shah, Bernd Schulz, Stefanie Girol-Gunia, Jon-Tobias Hoeft, “Automated creation of production metrology recipes based on design information,” in Metrology, Inspection, and Process Control for Microlithography XXII, John A. Allgair, ed., Proc. SPIE 6922, 2008. 206 KB PDF
  5. Benjamin Bunday, Pete Lipscomb, John Allgair, Dilip Patel, Mark Caldwell, Eric Solecky, Chas Archie, Jennifer Morningstar, Bryan J. Rice, Bhanwar Singh, Jason Cain, Iraj Emami, Bill Banke, Alfredo Herrera, Vladimir Ukraintsev, Jerry Schlessinger, Jeff Ritchison, “Realizing ‘value-added’ metrology,” in Metrology, Inspection, and Process Control for Microlithography XXI, Chas N. Archie, ed., Proc. SPIE 6518, 2007. 740 KB PDF
  6. Qiaolin (Charlie) Zhang, Cherry Tang, Jason Cain, Angela Hui, Tony Hsieh, Nick Maccrae, Bhanwar Singh, Kameshwar Poolla, Costas J. Spanos, “Across-wafer CD uniformity control through lithography and etch process: experimental verification,” in Metrology, Inspection, and Process Control for Microlithography XXI, Chas N. Archie, ed., Proc. SPIE 6518, 2007. 8.1 MB PDF
  7. Kevin Lensing, Jason Cain, Amogh Prabhu, Alok Vaid, Robert Chong, Richard Good, Bruno La Fontaine, Oleg Kritsun, “Lithography equipment control using scatterometry metrology and semi-physical modeling,” in Metrology, Inspection, and Process Control for Microlithography XXI, Chas N. Archie, ed., Proc. SPIE 6518, 2007. 1.4 MB PDF
  8. Alok Vaid, Kevin Lensing, Amogh Prabhu, Jason Cain, Qiaolin Zhang, Eric Apelgren, Bhanwar Singh, “Lithography equipment control using scatterometry metrology and semi-physical modeling”, AEC/APC Symposium XVIII, Westminster, Colorado, Oct. 2-4, 2006.
  9. Jason P. Cain, Cyrus Tabery, Luigi Capodieci, Kevin Lensing, Bhanwar Singh, “Use of Design Information for Automated Metrology Recipe Generation,” 7th European AEC/APC Conference, Aix-en-Provence, France, March 29-31, 2006.
  10. Jason P. Cain, Stephen Robie, Harish Bolla, Qiaolin Zhang, Bhanwar Singh, Iraj Emami, “Combined use of X-ray reflectometry and spectroscopic ellipsometry for characterization of thin film optical properties,” in Data Analysis and Modeling for Patterning Control III, Iraj Emami, ed., Proc. SPIE 6155, 2006. 487 KB PDF
  11. Patrick P. Naulleau, Clemens Rammeloo, Jason P. Cain, Kim Dean, Paul Denham, Kenneth A. Goldberg, Brian Hoef, Bruno La Fontaine, Adam R. Pawloski, Carl Larson, Greg Wallraff, “Investigation of the current resolution limits of advanced extreme ultraviolet (EUV) resists,” in Emerging Lithographic Technologies X, Michael J. Lercel, ed., Proc. SPIE 6151, 2006. 461 KB PDF
  12. Patrick Naulleau, Jason Cain, Kim Dean, Kenneth A. Goldberg, “Lithographic characterization of low-order aberrations in a 0.3-NA EUV microfield exposure tool,” in Emerging Lithographic Technologies X, Michael J. Lercel, ed., Proc. SPIE 6151, 2006. 231 KB PDF
  13. Patrick Naulleau, Jason P. Cain, Kim Dean, Kenneth A. Goldberg, “Lithographic characterization of low-order aberrations in the Berkeley MET tool,” 2005 EUVL Symposium, San Diego, California, Nov. 7-10, 2005.
  14. Patrick Naulleau, Clemens Rammeloo, Jason P. Cain, Kim Dean, Paul Denham, Kenneth A. Goldberg, Brian Hoef, Bruno La Fontaine, Adam Pawloski, Carl Larson, Greg Wallraff, “Investigation of the current resolution limits of advanced EUV resists,” 2005 EUVL Symposium, San Diego, California, Nov. 7-10, 2005.
  15. Jason P. Cain, Patrick Naulleau, Paul Denham, Kenneth A. Goldberg, Eric M. Gullikson, Brian Hoef, Costas J. Spanos, “Lithographic measurement of flare in the Berkeley MET optic,” 2005 EUVL Symposium, San Diego, California, Nov. 7-10, 2005.
  16. Kevin Lensing, Bhanwar Singh, Jason Cain, Matthew Purdy, “Beyond the algorithms: Better process control through advanced measurement technology,” AEC/APC Symposium XVII, Indian Wells, California, Sept. 24-29, 2005.
  17. Paul D. Friedberg, Yu Cao, Jason P. Cain, Ruth Wang, Jan M. Rabaey, Costas J. Spanos, “Modeling within-die gate length spatial correlation for process-design co-optimization,” IEEE International Symposium on Quality Electronic Design 2005. 510 KB PDF
  18. Paul D. Friedberg, Yu Cao, Jason P. Cain, Ruth Wang, Jan M. Rabaey, Costas J. Spanos, “Modeling within-die gate length spatial correlation for process-design co-optimization,” in Design and Process Integration for Microelectronic Manufacturing IV, Lars W. Liebmann, ed., Proc. SPIE 5756, 2005. 1.6 MB PDF
  19. Jason P. Cain, Patrick Naulleau, Costas J. Spanos, “Resist-based measurement of the contrast transfer function in a 0.3-NA microfield optic,” in Emerging Lithographic Technologies IX, R. Scott Mackay, ed., Proc. SPIE 5751, 2005. 2.1 MB PDF
  20. Jason P. Cain, Patrick Naulleau, Costas J. Spanos, “Critical dimension sensitivity to post exposure bake temperature variations in EUV photoresists,” in Emerging Lithographic Technologies IX, R. Scott Mackay, ed., Proc. SPIE 5751, 2005. 608 KB PDF
  21. Jason P. Cain, Patrick Naulleau, Costas J. Spanos, “Modeling of EUV photoresists using a resist point spread function,” in Emerging Lithographic Technologies IX, R. Scott Mackay, ed., Proc. SPIE 5751, 2005. 846 KB PDF
  22. Jason P. Cain, Greg McIntyre, Patrick Naulleau, Adam Pawloski, Bruno La Fontaine, Obert Wood, Andrew R. Neureuther, Costas J. Spanos, “Two-wave pattern shift aberration monitor for centrally obscured optical systems,” in Emerging Lithographic Technologies IX, R. Scott Mackay, ed., Proc. SPIE 5751, 2005. 988 KB PDF
  23. Jason P. Cain, Patrick Naulleau, Costas J. Spanos, “Lithographic measurement of EUV flare in the 0.3-NA Micro Exposure Tool optic at the Advanced Light Source,” in Emerging Lithographic Technologies IX, R. Scott Mackay, ed., Proc. SPIE 5751, 2005. 2.2 MB PDF
  24. Patrick P. Naulleau, Kenneth A. Goldberg, Erik H. Anderson, Jason P. Cain, Paul Denham, Brian Hoef, Keith Jackson, Anne-Sophie Morlens, Seno Rekawa, Kim Dean, “EUV microexposures at the ALS using the 0.3-NA MET projection optics,” in Emerging Lithographic Technologies IX, R. Scott Mackay, ed., Proc. SPIE 5751, 2005. 9.2 MB PDF
  25. Patrick Naulleau, Kenneth A. Goldberg, Erik Anderson, Jason P. Cain, Paul Denham, Brian Hoef, Keith Jackson, Anne-Sophie Morlens, Seno Rekawa, “High-resolution EUV microexposures at the ALS,” Third International EUVL Symposium, Miyazaki, Japan, November 1-4, 2004.
  26. Andrew R. Neureuther, Gregory R. McIntyre, Frank E. Gennari, Michael Lam, Jason P. Cain, Garth C. Robins, Edward Huang, Jihong Choi, Ling Wang, Lei Yuan, Hideaki Oshima, “Feature level test patterns for characterizing residual process effects,” in Design and Process Integration for Microelectronic Manufacturing II, Lars. W. Liebmann, Editor, Proceedings of SPIE 5379, pp. 76-84, 2004. 457 KB PDF
  27. Jason P. Cain, Costas J. Spanos, “Electrical linewidth metrology for systematic CD variation characterization and causal analysis,” in Metrology, Inspection, and Process Control for Microlithography XVII, Daniel J. Herr, ed., Proceedings of SPIE 5038, pp. 350-361, 2003. 486 KB PDF
  28. Haolin Zhang, Jason P. Cain, Costas J. Spanos, “Compact modeling of mask error factor for critical dimension control in optical lithography,” in Metrology, Inspection, and Process Control for Microlithography XVI, Daniel J. Herr, ed., Proceedings of SPIE 4689, pp. 462-465, 2002. 67 KB PDF
  29. Jason P. Cain, Haolin Zhang, Costas J. Spanos, “Optimum sampling for characterization of systematic variation in photolithography,” in Metrology, Inspection, and Process Control for Microlithography XVI, Daniel J. Herr, ed., Proceedings of SPIE 4689, pp. 430-442, 2002. 182 KB PDF

Journal Publications

  1. Patrick P. Naulleau, Jason P. Cain, “Experimental and model-based study of the robustness of line-edge roughness metric extraction in the presence of noise”, J. Vac. Sci. Technol. B, 25(5), pp. 1647-1657, Sep/Oct 2007.
  2. Benjamin D. Bunday, John A. Allgair, Mark Caldwell, Eric P. Solecky, Charles N. Archie, Bryan J. Rice, Bhanwar Singh, Jason P. Cain, Iraj Emami, “Value-added metrology,” IEEE Trans. Semiconduct. Manufact., 20(3), pp. 266-277, August 2007. 1.8 MB PDF
  3. Patrick Naulleau, Jason P. Cain, Erik Anderson, Kim Dean, Paul Denham, Kenneth A. Goldberg, Brian Hoef, Keith Jackson, “Characterization of the synchrotron-based 0.3 numerical aperture extreme ultraviolet microexposure tool at the Advanced Light Source,” J. Vac. Sci. Technol. B, 23(6), pp. 2840-2843, Nov./Dec. 2005. 608 KB PDF
  4. Patrick P. Naulleau, Jason P. Cain, Kenneth A. Goldberg, “Lithographic characterization of the spherical error in an in an extreme-ultraviolet optic by use of a programmable pupil fill illuminator,” Appl. Opt., 45(9), pp. 1957-1963, 20 March 2006. 335 KB PDF
  5. Patrick Naulleau, Kenneth A. Goldberg, Jason P. Cain, Erik H. Anderson, Kim R. Dean, Paul Denham, Brian Hoef, Keith H. Jackson, “Extreme Ultraviolet Lithography Capabilities at the Advanced Light Source Using a 0.3-NA Optic,” IEEE J. Quantum Electron., 42(1), pp. 44-50, Jan. 2006. 2.8 MB PDF
  6. Jason P. Cain, Patrick Naulleau, Costas J. Spanos, “Resist-based measurement of the contrast transfer function in a 0.3 numerical aperture extreme ultraviolet microfield optic,” J. Vac. Sci. Technol. B, 24(1), pp. 326-330, Jan./Feb. 2006. 308 KB PDF
  7. Jason P. Cain, Patrick P. Naulleau, Eric M. Gullikson, Costas J. Spanos, “Lithographic characterization of the flare in the Berkeley 0.3 numerical aperture extreme ultraviolet microfield optic,” J. Vac. Sci. Technol. B, 24(3), pp. 1234-1237, May/June 2006. 76 KB PDF
  8. Patrick Naulleau, Jason P. Cain, Kenneth A. Goldberg, “Lithographic characterization of the field dependent astigmatism and alignment stability of a 0.3 numerical aperture extreme ultraviolet microfield optic,” J. Vac. Sci. Technol. B 23(5), pp. 2003-2006, Sept./Oct. 2005. 155 KB PDF
  9. Patrick Naulleau, Kenneth A. Goldberg, Erik Anderson, Jason P. Cain, Paul Denham, Keith Jackson, Anne-Sophie Morlens, Seno Rekawa, Farhad Salmassi, “Extreme ultraviolet microexposures at the Advanced Light Source using the 0.3 numerical aperture micro-exposure tool optic,” J. Vac. Sci. Technol. B 22(6), pp. 2962-2965, Nov./Dec. 2004. 693 KB PDF

United States Patents

  1. Chris Haidinyak, Jason P. Cain, Bhanwar Singh, “Advanced process control framework using two-dimensional image analysis,” United States patent 7,875,851, 2011.
  2. Carsten Hartig, Jason P. Cain, “Incorporating film optical property measurements into scatterometry metrology,” United States patent 7,663,766, 2010.
  3. Jason P. Cain, Bhanwar Singh, Iraj Emami, “Transistor gate shape metrology using multiple data sources,” United States patent 7,373,215, 2008.
  4. Bhanwar Singh, Jason P. Cain, Harish K. Bolla, Iraj Emami, “Scanner optimization for reduced across-chip performance variation through non-contact electrical metrology,” United States patent 7,460,922, 2008.

Academic Publications

  1. Jason P. Cain, Characterization of the Critical Dimension Error Budget for Extreme Ultraviolet Lithography, Ph.D. dissertation, University of California, Berkeley, 2004. (Electronics Research Laboratory Memorandum No. UCB/ERL M04/50) 6.1 MB PDF
  2. Jason P. Cain, Characterization of Systematic Spatial Variation in Photolithography, M.S. thesis, University of California, Berkeley, 2002. (Electronics Research Laboratory Memorandum No. UCB/ERL M02/43) 11.6 MB PDF

Upcoming Publications